Xiao Yu, Yuchen Wang, Hong Zhou, Yanxiang Liu, Yi Wang, Tie Li, Yuelin Wang
State Key Laboratory of Transducer Technology & Science and Technology on Microsystem Laboratory, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China.
Small (Weinheim an der Bergstrasse, Germany) 2013 Feb 25The unique anisotropic wet-etching mechanism of a (111) silicon wafer facilitates the highly controllable top-down fabrication of silicon nanowires (SiNWs) with conventional microfabrication technology. The fabrication process is compatible with the surface manufacturing technique, which is employed to build a nanowire-based field-effect transistor structure on the fabricated SiNW. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Xiao Yu, Yuchen Wang, Hong Zhou, Yanxiang Liu, Yi Wang, Tie Li, Yuelin Wang. Top-down fabricated silicon-nanowire-based field-effect transistor device on a (111) silicon wafer. Small (Weinheim an der Bergstrasse, Germany). 2013 Feb 25;9(4):525-30
PMID: 23143874
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