Correlation Engine 2.0
Clear Search sequence regions

  • dermis (1)
  • fascia (1)
  • glaucoma (1)
  • graft (8)
  • humans (1)
  • patients (4)
  • pericardium (7)
  • prosthesis (1)
  • squint (1)
  • Sizes of these terms reflect their relevance to your search.

    Exposure of orbital implant post enucleation or evisceration remains one of the common complications irrespective of the type of implant used. Dermis fat graft and temporalis fascia have been used to repair the implant exposure in anophthalmic sockets. Tutoplast® pericardium, gamma sterilised dehydrated human pericardium, has been used as a scleral patch graft for glaucoma drainage device exposure and scleral thinning post squint surgery. We report the novel use of Tutoplast® patch graft to repair orbital implant exposure in this case series. The case notes of three patients who received Tutoplast® pericardium patch graft to repair implant exposure were reviewed. Data regarding presenting symptoms, implant type, time to exposure from primary surgery, post-operative complications and length of follow up post Tutoplast® pericardium patch graft were collected. Three patients presented with implant exposure following evisceration. The presenting symptoms were recurrent infection, discharging socket and discomfort in all three patients. One patient had a Medpore implant, two had silicone implants. Total follow-up ranged from 9 to 22 months. In all three cases, there was relief from symptoms and the graft had incorporated fully into the surrounding orbital tissue with no recurrent exposure noted during the follow-up period. Tutoplast® pericardium has demonstrated a good safety profile and is a suitable material to use as a patch graft for orbital implant exposure.


    Hetvi Bhatt, Linda Okafor, Rina Bhatt. Allogenic dehydrated human pericardium patch graft (Tutoplast): A novel use for reconstruction in orbital implant exposure. European journal of ophthalmology. 2022 Jan;32(1):725-728

    Expand section icon Mesh Tags

    Expand section icon Substances

    PMID: 33736492

    View Full Text